| Gallium(III) nitride |
|---|
|
| General | |
|---|---|
| Systematic name | Gallium(III) nitride |
| Other names | None Listed. |
| Molecular formula | GaN |
| Molar mass | 83.7297 g/mol |
| Appearance | Yellow powder. |
| CAS number | [25617-97-4] |
| Properties |
|---|
| Dielectric Constant | 5.35 |
| Thermal Conductivity | 1.3 W/cm/K |
| Coefficient of thermal expansion | 4x10-6 K-1 |
| Heat Capacity | 35.8 J mole-1 K-1[ J.Leitner, "High temperature enthalpy and heat capacity of GaN", Thermochimica Acta, Volume 401, Issue 2, 19 May 2003, Pages 169-173]] |
| Density and phase | 6.15 g/cm3, solid |
| Solubility in water | Reacts. |
| Melting point | >2500°C[[http://dx.doi.org/10.1063/1.1772878 Harafuji, Tsuchiya and Kawamura, J. Appl. Phys. 96, 2501-2512 (September 1, 2004)] |
| Boiling point | - |
| Basicity (p''K''b) | N/A |
| Electronic Properties |
|---|
| Band gap at 300 K | 3.43 eV |
| Electron effective mass | 0.2 me |
| Light hole effective mass | 0.3 me |
| Heavy hole effective mass | 0.3-2.2 me |
| Electron mobility at 300 K | 1000 cm²/(V·s) |
| Hole mobility at 300 K | 100 cm²/(V·s) |
| Structure |
|---|
| Crystal structure | Zinc Blende, Wurtzite |
| Hazards |
|---|
| MSDS | External MSDS |
| EU classification | None listed. |
| R-phrases | , , , . |
| S-phrases | , . |
| NFPA 704 | N/A |
| Flash point | Non-flammable. |
| Supplementary data page |
|---|
Structure and properties | ''n'', εr, etc. |
Thermodynamic data | Phase behaviour Solid, liquid, gas |
| Spectral data | UV, IR, NMR, MS |
| Related compounds |
|---|
| Other anions | None listed. |
| Other cations | None listed. |
| Related bases | None listed. |
| Related compounds | BN, InN, AlN, AlAs, InAs, GaSb, AlGaAs, InGaAs, GaAsP, GaAs, GaMe3, AsH3, GaP |
Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa)
|
'Gallium nitride' () is a direct-bandgap
semiconductor material of
wurtzite crystal structure with a wide (3.4
eV)
band gap, used in
optoelectronic, high-power and high-frequency devices. It is a binary
group III/
group V direct bandgap semiconductor. Its sensitivity to
ionizing radiation is low (like other
group III nitrides), making it a suitable material for
solar cell arrays for
satellites. Because GaN transistors can operate at much hotter temperatures and work at much higher voltages than GaAs transistors, they make ideal power amplifiers at microwave frequencies.
Physical properties
GaN is a very hard, mechanically stable material with large
heat capacity.
[Isamu Akasaki and Hiroshi Amano, "Crystal Growth and Conductivity Control of Group III Nitride Semiconductors and Their Application to Short Wavelength Light Emitters", Jpn. J. Appl. Phys. Vol.36(1997) 5393-5408 ] In its pure form it resists cracking and can be deposited in
thin film on
sapphire or
silicon carbide, despite the mismatch in their
lattice constants.
GaN can be
doped with
silicon (Si) or with
oxygen[[1] ] to
N-type and with magnesium (Mg) to
P-type,
[Hiroshi Amano, Masahiro Kito, Kazumasa Hiramatsu and Isamu Akasaki, "P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI)", Jpn. J. Appl. Phys. Vol. 28 (1989) L2112-L2114, ] however the Si and Mg atoms change the way the GaN crystals grow, introducing
tensile stresses and making them brittle.
[Shinji Terao, Motoaki Iwaya, Ryo Nakamura, Satoshi Kamiyama, Hiroshi Amano and Isamu Akasaki, "Fracture of AlxGa1-xN/GaN Heterostructure —Compositional and Impurity Dependence—", Jpn. J. Appl. Phys. Vol. 40 (2001) L195-L197, ] GaN crystals are also rich in defects; 100 million to 10 billion per cm².
[1]
GaN based parts are very sensitive to
electrostatic discharge.
[Hajime Okumura, "Present Status and Future Prospect of Widegap Semiconductor High-Power Devices", Jpn. J. Appl. Phys. Vol. 45 (2006) 7565-7586, ]
Developments
To develop such novel devices and clarify the intrinsic materials properties of nitrides, it is essential to grow high-quality single crystals and control their electrical conductivity. However, high-quality epitaxial GaN is difficult to grow and its conductivity is hard to control. These problems have prevented the development of GaN-based p-n junction blue-light-emitting devices for many years
The high crystalline quality of GaN can be realized by low temperature deposited buffer layer technology.
[2] This high crystalline quality GaN led to the discovery of p-type GaN
, p-n junction blue/UV-
LEDs
and room-temperature stimulated emission
[Hiroshi Amano, Tsunemori Asahi and Isamu Akasaki, "Stimulated Emission Near Ultraviolet at Room Temperature from a GaN Film Grown on Sapphire by MOVPE Using an AlN Buffer Layer", Jpn. J. Appl. Phys. Vol. 29 (1990) L205-L206 ] (indispensable for laser action).
[Isamu Akasaki, Hiroshi Amano, Shigetoshi Sota, Hiromitsu Sakai, Toshiyuki Tanaka and Masayoshi Koike, "Stimulated Emission by Current Injection from an AlGaN/GaN/GaInN Quantum Well Device", Jpn. J. Appl. Phys. Vol.34(1995) L1517-L1519 ] This has led to the commercialization of high-performance blue LEDs and long-lifetime violet-laser diodes (LDs), and to the development of nitride-based devices such as UV detectors and high-speed
field-effect transistors.
High-brightness GaN light-emitting diodes (LEDs) completed the range of primary colors, and made applications such as daylight visible full-color LED displays, white LEDs and blue
laser devices possible. The first GaN-based high-brightness LEDs were using a thin film of GaN deposited via
MOCVD on
sapphire. Other substrates used are
zinc oxide, with
lattice constant mismatch only 2%, and
silicon carbide (SiC).
Group III nitride semiconductors are recognized as one of the most promising materials for fabricating optical devices in the visible short-wavelength and UV region. Potential markets for high-power/high-frequency devices based on GaN include
microwave radio-frequency power amplifiers (such as used in high-speed wireless data transmission) and high-voltage switching devices for power grids. A potential mass-market application for GaN-based RF
transistors is as the microwave source for
microwave ovens, replacing the
magnetrons currently used. The large band gap means that the performance of GaN transistors is maintained up to higher temperatures than silicon transistors.
Applications
GaN, when doped with a suitable
transition metal such as
manganese, is a promising
spintronics material (
magnetic semiconductors).
Nanotubes of GaN are proposed for applications in nanoscale
electronics, optoelectronics and biochemical-sensing applications
[Goldberger et al, Nature 422, 599-602 (10 April 2003)]
GaN-based blue
laser diodes are used in the
Blu-ray disc technology, and in devices such as the
Sony PlayStation 3.
The mixture of GaN with
In (
InGaN) or
Al (
AlGaN) with a band gap dependent on ratio of In or Al to GaN allows to build Light Emitting Diodes (
LEDs) with colors that can go from red to blue.
Safety and toxicity aspects
The toxicology of GaN has not been fully investigated. The dust is an irritant to skin, eyes and lungs. The environment, health and safety aspects of gallium nitride sources (such as
trimethylgallium and
ammonia) and industrial hygiene monitoring studies of
MOVPE sources have been reported recently in a review
[3].
See also
★
Schottky diode
★
Semiconductor devices
★
Molecular-beam epitaxy
★
Epitaxy
References
1. lbl.gov, blue-light-diodes
2. Applied Physics Letters, Volume 48, Issue 5, pp. 353-355 [2]
3. Journal of Crystal Growth (2004);
Further reading
★
Isamu Akasaki and Hiroshi Amano: "Breakthroughs in Improving Crystal Quality of GaN and Invention of the p–n Junction Blue-Light-Emitting Diode" Japanese Journal of Applied Physics, Vol. 45, No. 12, 2006, pp. 9001-9010.
★ Isamu Akasaki and Hiroshi Amano: " Crystal Growth and Conductivity Control of Group III Nitride Semiconductors and Their Application to Short Wavelength Light Emitters" Japanese Journal of Applied Physics, Vol. 36, 1997, pp. 5393-5408.
★ Shuji Nakamura, Gerhard Fasol, Stephen J. Pearton, ''The Blue Laser Diode : The Complete Story'', Springer; 2nd edition, October 2, 2000, (ISBN 3-540-66505-6)
★ Jacques I. Pankove, T. D. Moustakas, ''Gallium Nitride (GaN) II: Semiconductors and Semimetals'', Academic Press, 1998 (ISBN 0-12-752166-6)
★
Shuji Nakamura, Gerhard Fasol, Stephen J Pearton The Blue Laser Diode: The Complete Story, Springer Verlag, 2nd Edition (October 2, 2000)
★
UCSB Press release describing Shuji Nakamura's work.
External links
Generic
★
The Cambridge center for galium nitride (GaN).
★
Photonics Sources Group, Tyndall National Institute GaN and other photonics research at the Tyndall National Institute, Ireland.
★
External MSDS Data Sheet.
★
Ioffe data archive
★
National Compound Semiconductor Roadmap page at ONR
★
Nitronex Nitronex is a corporation that is manufacturing GaN on silicon RF power transistors and GaN on silicon epi wafers for sale.
★
Semiconductor Today: Online resource covering compound semiconductors and advanced silicon materials and devices
Commercial links
★
Informative commercial link to Trimethylgallium and other metalorganics.
★
Interactive Vapor Pressure Chart for metalorganics.